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Department of Chemistry and Materials Science

Microfabrication

The group develops micro- and nanofabrication processes for applications in fluidic, chemical, biological, mechanical and thermal devices.
Micronova_cleanroom research

Our research areas:

  1. Micro- and nanofabrication
  2. Microfluidics and wetting
  3. Coatings and surface treatments

We employ a wide range of micro- and nanofabrication tools at Aalto Nanofab to create structures, devices and surfaces for fluidic, thermal, and biological applications. We have projects on neurons-on-a-chip (MEAs, carbon microelectrodes, dopamine analysis), carbon-MEMS (pyrolytic SU-8), superhydrophobic surfaces (blood repellency, icephobicity, antifouling and oleophobicity), foam materials (thermal insulation), single cell trapping (patterned superhydrophobic surfaces), flexible devices (metallization of elastomers).

Silicon research

Materials we work with:

  • Silicon (bulk and SOI), Pyrex, Kapton, Aluminum as substrates
  • AZ positive resists (also with image reversal), SU-8 and NXT15 negative resists
  • PDMS and thiolenes for replica moulding
  • Plasma Teflon and spin coated CYTOP for hydrophobic coatings
  • SAMs made by wet and dry techniques
  • Plasma deposited carbon materials (DLC, nc-C, ta-C)
  • UV-sensitive sol-gel materials (SiO2, Al2O3)
  • ALD films: TiO2, SiO2, Al2O3, TiN, NbN, Pt, nanolaminates
  • Metals (Al, Cr, Cu, W, Pt) by sputtering and evaporation

Our research through images:

CHEM_Microfabrication group_ZnO ALD coated AAAO
CHEM_Microfabrication grup_Cu-PDMS superhydrophobic with 5 liquids
CHEM_Microfabrication group_polarr

Cu-PDMS superhydrophobic with 5 liquids

CHEM_Microfabrication grup_Cu-PDMS superhydrophobic with 5 liquids
CHEM_Microfabrication group_polarr
CHEM_Microfabrication group_Radial arrays

PolarR

CHEM_Microfabrication group_polarr
CHEM_Microfabrication group_Radial arrays
CHEM_Microfabrication gropu_Korea NC MEA

Radial arrays

CHEM_Microfabrication group_Radial arrays
CHEM_Microfabrication gropu_Korea NC MEA
CHEM_Microfabrication group_MEA pillars schematic 3D

Korea NC MEA

CHEM_Microfabrication gropu_Korea NC MEA
CHEM_Microfabrication group_MEA pillars schematic 3D
CHEM_Microfabrication group_MicroPESI and coin

MEA pillars schematic 3D

CHEM_Microfabrication group_MEA pillars schematic 3D
CHEM_Microfabrication group_MicroPESI and coin
CHEM_Microfabrication group_Nebulizer chips packaged

MicroPESI and coin

CHEM_Microfabrication group_MicroPESI and coin
CHEM_Microfabrication group_Nebulizer chips packaged
CHEM_Microfabrication group_Serif-T mushrooms

Nebulizer chips packaged

CHEM_Microfabrication group_Nebulizer chips packaged
CHEM_Microfabrication group_Serif-T mushrooms
CHEM_Microfabrication group_SU-8 ESI array with coin

Serif-T mushrooms

CHEM_Microfabrication group_Serif-T mushrooms
CHEM_Microfabrication group_SU-8 ESI array with coin
CHEM_Microfabrication group_Wafer with SU-8 separation chips

SU-8 ESI array with coin

CHEM_Microfabrication group_SU-8 ESI array with coin
CHEM_Microfabrication group_Wafer with SU-8 separation chips
CHEM_Microfabrication group_Woodpile of PLA

Wafer with SU-8 separation chips

CHEM_Microfabrication group_Wafer with SU-8 separation chips
CHEM_Microfabrication group_Woodpile of PLA
CHEM_Microfabrication group_ZnO ALD coated AAAO

Woodpile of PLA

CHEM_Microfabrication group_Woodpile of PLA
CHEM_Microfabrication group_ZnO ALD coated AAAO
CHEM_Microfabrication grup_Cu-PDMS superhydrophobic with 5 liquids

ZnO ALD coated AAAO

Micronova Cleanroom

Our work at Micronova cleanroom

We work on silicon, glass and polymer technologies, utilizing the cleanroom. Micronova is the largest research cleanroom in northern Europe with its 2600 m2 of class 10-class 1000 space, shared between VTT and Aalto University. Micronova is equipped with a wide range of processing tools for MEMS, CMOS, III-V and polymer technologies.

Micronova cleanroom equipment

Examples of our equipment:

  • optical lithography with backside alignment (Süss MA-6)
  • DRIE (Oxford 100 cryo and STS Bosch) and RIE (Oxford 80)
  • PECVD (Oxford 80)
  • ALD (Picosun R200 and Beneq TFS 500 thermal and Beneq TFS 500 plasma)
  • sputtering (various tools) and evaporation (various tools)
  • Centrotherm tube furnaces (thermal oxidation, LPCVD poly, LPCVD nitride)
  • AML bonder/nanoimprint

For a complete list of equipment, see:

Research group members:

Latest publications:

More information on our research in the Aalto research portal.
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